Contact Aligner
Contact Printing
- mask and wafer in direct contact, high resolution of the order of 1µm, the problem with dust particles. 掩膜与晶圆直接接触，具有约 1µm 级别的高分辨率，但存在灰尘颗粒问题。
Diffraction in Contact Printing
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Contact Aligner: mask is in hard contact with resist and may cause damage to mask Mask和光刻胶影接触，可能会损坏光刻胶
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not diffraction limited 没有衍射限制
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It is important to keep the mask as close to the sample as possible by using the high precision vacuum seal on the aligner. mask和sample之间需要越近越好
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This reduces diffraction of light caused by the gap between the mask and the sample, and hence improves the resolution. 这样会减少由于mask和sample之间间距导致的衍射，从而提高精度
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This also makes a steady distribution of UV light across all of the exposure area. 这样也会让UV光在整个曝光区域均匀分布