- For line and spaces pattern (diffraction grating) on lithography masks, rather than a single aperture, the Fraunhofer diffraction image has minimum and maximum. 对于光刻掩模上的线和间隙图样(衍射光栅),与单一光圈不同,夫琅禾费衍射图像具有最小值和最大值。(产生的图案是波动的)
- Modulation Transfer Function的定义为:
![[Pasted image 20250218161515.png#pic_center|]]
- 一般来说
需要大于0.5(光刻胶的CMTF)来让光刻胶展现出特征