Process Summary: Transfers the mask image to the resist-coated wafer 将掩膜上的图案转移到涂有光刻胶的晶圆上 Activates photo-sensitive components of the resist 激活光刻胶的光敏成分 Quality measures: Linewidth resolution 线宽分辨率 Overlay accuracy 叠层精度 Particles and defects 粒子和缺陷